Lithography / Stefan Landis.
Publication details: Hoboken, NJ : Wiley-ISTE, 2010.Description: xv, 377 p. : ill. ; 24 cmISBN:- 9781848212022
| Item type | Current library | Home library | Collection | Call number | Materials specified | Copy number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|---|
| AM | PERPUSTAKAAN LINGKUNGAN KEDUA | PERPUSTAKAAN LINGKUNGAN KEDUA KOLEKSI AM-P. LINGKUNGAN KEDUA | - | TK7872.M3 L336 3 (Browse shelf(Opens below)) | 1 | Available | 00002034668 |
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| TK7872.M25C65 Computational magnetics / | TK7872.M25D45 Ferromagnetic-core design and application handbook / | TK7872.M25J56 2002 3 The finite element method in electromagnetics / | TK7872.M3 L336 3 Lithography / | TK7872.M3E44 3 Integrated circuit mask technology / | TK7872.M3E994 Extreme ultraviolet lithography / | TK7872.M3H366 3 Handbook of photomask manufacturing technology / |
Includes bibliographical references and index.
'Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components'-- Provided by publisher.
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