000 01435nam a22003374a 4500
005 20250918145639.0
008 111123s2011 enka b 001 0 eng
020 _a9781848212114 (hbk.)
_cRM375.28
020 _a1848212119
039 9 _a201112131552
_brosli
_c201111231502
_dfarid
_c201111231437
_dfarid
_y11-23-2011
_zfarid
040 _aUKM
041 1 _aeng
_hfre
090 _aTK7872.M3N34413 3
090 _aTK7872.M3
_bN34413
130 0 _aNanolithography
_lEnglish
245 1 0 _aNano-lithography /
_cedited by Stefan Landis.
260 _aHoboken, NJ :
_bWiley,
_c2011.
300 _axxv, 325 p. :
_bill. ;
_c24 cm.
504 _aIncludes bibliographical references and index.
505 0 _aCh. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.
650 0 _aMicrolithography.
650 0 _aNanotechnology.
700 1 _aLandis, Stefan.
907 _a.b15201569
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTK7872.M3N34413 3
914 _avtls003483488
990 _ark4
991 _aPrInstitut Kejuruteraan Mikro & Nanoelektronik (IMEN)
998 _al
_b2011-10-11
_cm
_da
_feng
_genk
_y0
_z.b15201569
999 _c504359
_d504359