| 000 | 01328nam a2200361 a 4500 | ||
|---|---|---|---|
| 005 | 20250918130125.0 | ||
| 008 | 110321s2010 njua b 001 0 eng | ||
| 020 |
_a9780470596975 (hbk.) _cRM305.85 |
||
| 039 | 9 |
_a201106141456 _brosli _c201106141225 _drosli _c201106020931 _drasyilla _y03-21-2011 _zrasyilla |
|
| 040 | _aUKM | ||
| 090 | _aTK7872.M3M33 3 | ||
| 090 |
_aTK7872.M3 _bM33 |
||
| 100 | 1 |
_aMa, Xu, _d1983- |
|
| 245 | 1 | 0 |
_aComputational lithography / _cXu Ma and Gonzalo R. Arce. |
| 260 |
_aHoboken, N.J. : _bWiley, _c2010. |
||
| 300 |
_axv, 226 p. : _bill. ; _c25 cm. |
||
| 490 | 1 | _aWiley series in pure and applied optics | |
| 504 | _aIncludes bibliographical references (p. 217-222) and index. | ||
| 650 | 0 |
_aMicrolithography _xMathematics. |
|
| 650 | 0 |
_aIntegrated circuits _xDesign and construction _xMathematics. |
|
| 650 | 0 |
_aPhotolithography _xMathematics. |
|
| 650 | 0 |
_aSemiconductors _xEtching _xMathematics. |
|
| 650 | 0 | _aResolution (Optics) | |
| 700 | 1 | _aArce, Gonzalo R. | |
| 830 | 0 | _aWiley series in pure and applied optics. | |
| 907 |
_a.b14975798 _b2021-05-28 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTK7872.M3M33 3 |
||
| 914 | _avtls003459651 | ||
| 990 | _ark4 | ||
| 991 | _aFakulti Kejuruteraan dan Alam Bina - Pasca | ||
| 998 |
_al _b2011-08-03 _cm _da _feng _gnju _y0 _z.b14975798 |
||
| 999 |
_c482392 _d482392 |
||