| 000 | 01259pam a2200313 a 4500 | ||
|---|---|---|---|
| 005 | 20250914173459.0 | ||
| 008 | 080425s1998 njua bf 001 0 eng | ||
| 020 | _a0815514220 | ||
| 020 |
_a9780815514220 _cRM881.46 |
||
| 039 | 9 |
_a200811201119 _blan _c200811141206 _drahah _y04-25-2008 _zsanusi |
|
| 040 | _aUKM | ||
| 090 | _aTS695.M384 3 | ||
| 090 |
_aTS695 _b.M384 |
||
| 100 | 1 | _aMattox, D. M. | |
| 245 | 1 | 0 |
_aHandbook of physical vapor deposition (PVD) processing : _bfilm formation, adhesion, surface preparation and contamination control / _cby Donald M. Mattox |
| 260 |
_aWestwood, New Jersey : _bNoyes Publications, _c1998 |
||
| 300 |
_axxvii, 917 p. : _bill. ; _c24 cm. |
||
| 504 | _aIncludes bibliographical references and index | ||
| 650 | 0 |
_aPhysical vapor deposition _vHandbooks, manuals, etc. |
|
| 856 | 4 | 2 |
_3Publisher description _uhttp://www.loc.gov/catdir/description/wap041/97044664.html |
| 856 | 4 | 1 |
_3Table of contents _uhttp://www.loc.gov/catdir/toc/wap041/97044664.html |
| 907 |
_a.b14181344 _b2021-05-28 _c2019-11-12 |
||
| 942 |
_c01 _n0 _kTS695.M384 3 |
||
| 914 | _avtls003375876 | ||
| 990 | _arab | ||
| 991 | _aInstitut Kej. Mikro & Nanoelektronik | ||
| 998 |
_al _b2008-12-04 _cm _da _feng _gnju _y0 _z.b14181344 |
||
| 999 |
_c413648 _d413648 |
||