000 01104nam a2200337 a 4500
005 20250913134745.0
008 981208s1970 xxu 00 eng
020 _a0124808506
035 _a475949
039 9 _a201406301218
_bjamil
_y08-18-1999
_zload
040 _aUKM
090 _aTK7871.85.M38
090 _aTK7871.85
_b.M38
100 1 _aMayer, J. W.
_q(James W.),
_d1930-
245 1 0 _aIon implantation in semiconductors
_bsilicon and germanium /
_cby James W. Mayer, Lennart Eriksson and John A. Davies.
260 _aNew York :
_bAcademic Press,
_c1970.
300 _axiii, 280 p. :
_bill. ;
_c24 cm.
504 _aIncludes bibliographical references.
590 _a1
650 _aIon implantation
650 _aSemiconductors
700 1 _aEriksson, Lennart,
_d1938-
700 1 _aDavies, John Arthur,
_d1927-
907 _a.b11146497
_b2021-05-28
_c2019-11-12
942 _c01
_n0
_kTK7871.85.M38
914 _avtls000119147
991 _aFakulti Sains Fizik dan Gunaan
998 _al
_b1999-05-08
_cm
_da
_feng
_gxxu
_y0
_z.b11146497
999 _c116429
_d116429