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	1.	The chemistry of metal CVD / edited by Toivo T. Kodas and Mark J. Hampden-Smith by Kodas, Toivo T Hampden-Smith, Mark J Publication details: Weinheim : VCH, 1994 Availability: Items available for loan: PERPUSTAKAAN LINGKUNGAN KEDUA (1)Call number: TK7867.C46. Place hold
	2.	Luminous chemical vapor deposition and interface engineering / Hirotsugu Yasuda by Yasuda, H Series: Surfactant science series ; v. 122 Publication details: New York : Marcel Dekker, c2005 Online resources: Publisher description Availability: Items available for loan: PERPUSTAKAAN LINGKUNGAN KEDUA (1)Call number: QD381.8.Y378 3. Place hold
	3.	Chemical vapour deposition [electronic resource] : an integrated engineering design for advanced materials / by Yongdong Xu, Xiu-Tian Yan. by Xu, Yongdong Yan, Xiu-Tian SpringerLink (Online service) Series: Engineering materials and processes Publication details: London : Springer-Verlag London, 2010 In: Springer eBooks Online resources: Click here to access online Availability: No items available.
	4.	Magneto luminous chemical vapor deposition / Hirotsugu Yasuda. by Yasuda, H Series: Green chemistry and chemical engineering Publication details: Boca Raton, FL : CRC Press, 2011 Availability: Items available for loan: PERPUSTAKAAN LINGKUNGAN KEDUA (1)Call number: QD591.Y378 3. Place hold

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