Computational lithography / Xu Ma and Gonzalo R. Arce.

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Series: Wiley series in pure and applied opticsPublication details: Hoboken, N.J. : Wiley, 2010.Description: xv, 226 p. : ill. ; 25 cmISBN:

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Holdings
Item type	Current library	Home library	Collection	Call number	Materials specified	Copy number	Status	Date due	Barcode
AM	PERPUSTAKAAN LINGKUNGAN KEDUA	PERPUSTAKAAN LINGKUNGAN KEDUA KOLEKSI AM-P. LINGKUNGAN KEDUA	-	TK7872.M3M33 3 (Browse shelf(Opens below))		1	Available		00002033466

Includes bibliographical references (p. 217-222) and index.

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