Ma, Xu,  1983- <br/><br/>
Computational lithography / 
Xu Ma and Gonzalo R. Arce. 
 - Hoboken, N.J. :  Wiley,  2010. 
 - xv, 226 p. :  ill. ;  25 cm. 
 - Wiley series in pure and applied optics .
 - Wiley series in pure and applied optics. .
<br/><br/>Includes bibliographical references (p. 217-222) and index. 
<br/><br/><label>ISBN: </label>9780470596975 (hbk.)  RM305.85 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography--Mathematics.<br/>Integrated circuits--Design and construction--Mathematics.<br/>Photolithography--Mathematics.<br/>Semiconductors--Etching--Mathematics.<br/>Resolution (Optics)