Extreme ultraviolet lithography / 
[edited by] Banqiu Wu, Ajay Kumar. 
 - New York :  McGraw-Hill,  2009 
 - xiv, 465 p. :  ill. ;  24 cm. 
<br/><br/>Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>9780071549189 (hbk.)  RM362.25 0071549188 (hbk.) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Extreme ultraviolet lithography<br/>Integrated circuits--Masks<br/>Integrated circuits--Design and construction