Reactive Sputter Deposition  [electronic resource] / 
edited by Diederik Depla, Stijn Mahieu. 
 - Berlin, Heidelberg :  Springer-Verlag Berlin Heidelberg,  2008. 
 - xviii, 570 p. :  ill. (some col.), digital ;  25 cm. 
 - Springer Series in Materials Science,  109  0933-033X ; .
<br/><br/><label>ISBN: </label>9783540766643 (electronic bk.) 9783540766629 (paper) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Cathode sputtering (Plating process)<br/>Thin films.<br/>Chemistry.<br/>Condensed Matter.<br/>Industrial Chemistry/Chemical Engineering.<br/>Physical Chemistry.<br/>Surfaces and Interfaces, Thin Films.
<br/><br/><label>Dewey Class. No.: </label>621.38152