Ferroelectric Thin Films  Basic Properties and Device Physics for Memory Applications /  [electronic resource] : 
edited by Yoshihiro Ishibashi, Masanori Okuyama. 
 - Berlin Heidelberg :  Springer-Verlag GmbH.,  2005 
 - xiii, 244 p. :  ill., digital ;  24 cm. 
 - Topics in Applied Physics,  98  0303-4216 ; .
<br/><br/><label>ISBN: </label>9783540314790 (electronic bk.) 9783540241638 (paper) 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Thin films.<br/>Ferroelectricity.<br/>Physics.<br/>Crystallography.<br/>Electronics and Microelectronics, Instrumentation.<br/>Magnetism, Magnetic Materials.<br/>Metallic Materials.<br/>Physics and Applied Physics in Engineering.
<br/><br/><label>LC Class. No.: </label>TA418.9.T45  / F465 2005 
<br/><br/><label>Dewey Class. No.: </label>621.39732