The chemistry of metal CVD / 
edited by Toivo T. Kodas and Mark J. Hampden-Smith 
 - Weinheim :  VCH,  1994 
 - xxiv, 530 p. :  ill. ;  24 cm. 
<br/><br/>Bibliography :  p. 417-427 
<br/><br/><label>ISBN: </label>3527290710 
<br/><br/><label>LCCN: </label>94-022847 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Electronic circuit design<br/>Chemical vapor deposition<br/>Metallic films