TY  - BOOK
AU  - Drosd,Robert M.
TI  - A model of the recrystallization mechanism of amorphous silicon layers created by ion implantation
PY  - 1980///
CY  - Ann Arbor, Mich.
PB  - University Microfilms International
KW  - Silicon crystals
KW  - Thin films
N1  - Thesis (Ph.D.)-University of California, 1979
ER  -