Drosd, Robert M. <br/><br/>
A model of the recrystallization mechanism of amorphous silicon layers created by ion implantation / 
Robert M. Drosd 
 - 1 microfiche ;  11 x 15 cm. 
<br/><br/>Thesis (Ph.D.)-University of California, 1979 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Silicon crystals.<br/>Thin films.