Rekabentuk dan pengoptimuman parameter proses MOSFET planar berteknologi 22 nm menggunakan kaedah Taguchi / Afifah Maheran binti Abdul Hamid.
Producer: 2015Description: xxi, 186 pages : illustrations ; 30 cmContent type:- text
- unmediated
- volume
| Item type | Current library | Home library | Collection | Call number | Materials specified | Copy number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|---|
| TERHAD | PERPUSTAKAAN LINGKUNGAN KEDUA | PERPUSTAKAAN LINGKUNGAN KEDUA TESIS-P. LINGKUNGAN KEDUA | - | TK7871.99.M44A355 2015 3 tesis (Browse shelf(Opens below)) | 1 | Available | 00002175194 |
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| TK7871.95.W3527 2008 3tesis Mechanical stress effect on mosfets of 130 nm technology / | TK7871.96.B55S535 2016 3 tesis Enhanced control algorithm for distribution static compensator using phase space technique / | TK7871.99.M44 S34 1994 3 tesis A Study of submicron mosfet characteristics / | TK7871.99.M44A355 2015 3 tesis Rekabentuk dan pengoptimuman parameter proses MOSFET planar berteknologi 22 nm menggunakan kaedah Taguchi / | TK7871.99.M44B336 2018 3 tesis Design of a low power compact direct conversion transmitter in 0.13uM cmos process for 2.4 ghz rf devices / | TK7871.99.M44B498 2016 3 tesis Design of a low power compact CMOS direct conversion receiver for 2.4 GHz RFID applications / | TK7871.99.M44E445 2012 3tesis Optimization of process parameters for 32 nm CMOS device / |
Tesis (Ph.D.)- Universiti Kebangsaan Malaysia, 2015.
Rujukan : mukasurat 158-166.
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