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Advances in CMP/polishing technologies for the manufacture of electronic devices / edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
Publication details: Oxford : Elsevier, c2012.Description: xii, 317 p. : ill. ; 24 cmISBN:- 9781437778595
- 1437778593
- CMP polishing technologies for the manufacture of electronic devices [Portion of title]
| Item type | Current library | Home library | Collection | Call number | Materials specified | Copy number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|---|
| AM | PERPUSTAKAAN TUN SERI LANANG | PERPUSTAKAAN TUN SERI LANANG KOLEKSI AM-P. TUN SERI LANANG (ARAS 5) | - | TJ1280.A388 (Browse shelf(Opens below)) | 1 | Available | 00002079564 |
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| TJ1191 .M24 3 Principles of electrochemical machining / | TJ1201.S34R935 ikon One good turn : a natural history of the screwdriver and the screw / | TJ126081.C45 Manual of drilling technology / | TJ1280.A388 Advances in CMP/polishing technologies for the manufacture of electronic devices / | TJ1280.F3 Abrasive methods engineering / | TJ1280.F3 Abrasive methods engineering / | TJ1317.B66 3 Automatic assembly / |
Includes bibliographical references and index.
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover.
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