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Nano-lithography / edited by Stefan Landis.

Contributor(s): Language: English Original language: French Publication details: Hoboken, NJ : Wiley, 2011.Description: xxv, 325 p. : ill. ; 24 cmISBN:
  • 9781848212114 (hbk.)
  • 1848212119
Uniform titles:
  • Nanolithography English
Subject(s):
Contents:
Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.
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Item type Current library Home library Collection Call number Materials specified Copy number Status Date due Barcode
AM PERPUSTAKAAN LINGKUNGAN KEDUA PERPUSTAKAAN LINGKUNGAN KEDUA KOLEKSI AM-P. LINGKUNGAN KEDUA - TK7872.M3N34413 3 (Browse shelf(Opens below)) 1 Available 00002054923
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TK7872.M3H366 3 Handbook of photomask manufacturing technology / TK7872.M3L565 3 Optical lithography : here is why / TK7872.M3M33 3 Computational lithography / TK7872.M3N34413 3 Nano-lithography / TK7872.M5M33 1993 Microwave mixers / TK7872.O7 G68 Oscillator circuits TK7872.O7 R54 Oscillator design and computer simulation /

Includes bibliographical references and index.

Ch. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.

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