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Computational lithography / Xu Ma and Gonzalo R. Arce.
Series: Wiley series in pure and applied opticsPublication details: Hoboken, N.J. : Wiley, 2010.Description: xv, 226 p. : ill. ; 25 cmISBN:- 9780470596975 (hbk.)
| Item type | Current library | Home library | Collection | Call number | Materials specified | Copy number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|---|
| AM | PERPUSTAKAAN LINGKUNGAN KEDUA | PERPUSTAKAAN LINGKUNGAN KEDUA KOLEKSI AM-P. LINGKUNGAN KEDUA | - | TK7872.M3M33 3 (Browse shelf(Opens below)) | 1 | Available | 00002033466 |
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| TK7872.M3E994 Extreme ultraviolet lithography / | TK7872.M3H366 3 Handbook of photomask manufacturing technology / | TK7872.M3L565 3 Optical lithography : here is why / | TK7872.M3M33 3 Computational lithography / | TK7872.M3N34413 3 Nano-lithography / | TK7872.M5M33 1993 Microwave mixers / | TK7872.O7 G68 Oscillator circuits |
Includes bibliographical references (p. 217-222) and index.
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