Study of tunneling and breakdown mechanisms of gate oxide in MOSFET

Karim, Mohammed Fakhrul

Study of tunneling and breakdown mechanisms of gate oxide in MOSFET Mohammed Fakhrul Karim - Universiti Kebangsaan Malaysia, Bangi Faculty of Engineering 1996 - 129 p. : ill. ; 30 cm.

Thesis (M.Sc.) - Universiti Kebangsaan Malaysia, 1996

References : p. 118-123


Metal oxide semiconductor field--effect transistors

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